| Development of A Low Cost Equipment Spray - CVD for Deposition of Oxide Films | |
| अन्वेषक | Dr. S. Basu Mr. Somenath Roy Mr. Saroj Kr. Singh |
| Patent | 199419 |
| A system for spray – CVD intended for vapour phase deposition of material on substrates such as oxide thin / thick films and a process for carrying out such spray CVD using such a system. The system involves a novel technique spray – CVD deposition of oxide thin / thick films. In particular the system includes spray gun adapted to generate regulated atomized droplets of the spraying material; a substrate positioned above said spray gun and importantly means to regulate the temperature profile of the atomized droplets during its traverse from the spray gun nozzle up to said substrate for deposition, such that the said droplets strike the substrate in vapour form for uniform deposition on said substrate substantially free of any micro porosity. The system can be used in particular for producing high quality oxide films by way of cost-effective process for various applications such a gate oxide in MOS capacitor and MOSEFTs, as oxide barrier in tunnel diodes, development of ceramic oxide sensors, anti-reflection coating on solar cells and oxide coating on mechanical cutting tools. | |
| प्रभारी प्राध्यापक, IPR & IR प्रायोजित शोध एवं औद्योगिक सलाहकारिता भारतीय प्रौद्योगिकी संस्था खड़गपुर 721302 भारत ई-मेल: ipr @ sric.iitkgp.ernet.in |
संकायाध्यक्ष प्रायोजित शोध एवं औद्योगिक सलाहकारिता भारतीय प्रौद्योगिकी संस्था खड़गपुर 721302 भारत ई-मेल: deansr @ hijli.iitkgp.ernet.in |