A method of fused deposition with improved bonding strength through electro chemical discharges on a substrate | |
अन्वेषक | प्रोफेसर P. K. Mishra Prof.Amitaha Ghosh |
Patent | 199414 |
This invention relates to a method of fused deposition with improved bonding strength through electrochemical discharges on a substrate comprising the steps of setting up an electrochemical cell comprising an anode, the substrate such as herein described acting as a cathode and an electrolyte; flowing a non-submerged jet stream of electrolyte by a rotatable nozzle to impinge on said cathode; applying an electrical discharge between said anode and said cathode from an external DC circuit; rotating said rotatable nozzle in relating to said cathode while deposition is occurring to selectively and rapidly write tracks and patterns; characterized in that said anode is placed within said non-submerged jet stream and said electrical discharge cheating continuous discrete sparks stabilizing the fusing of metals just after deposition. |
प्रभारी प्राध्यापक, IPR & IR प्रायोजित शोध एवं औद्योगिक सलाहकारिता भारतीय प्रौद्योगिकी संस्था खड़गपुर 721302 भारत ई-मेल: ipr @ sric.iitkgp.ernet.in |
संकायाध्यक्ष प्रायोजित शोध एवं औद्योगिक सलाहकारिता भारतीय प्रौद्योगिकी संस्था खड़गपुर 721302 भारत ई-मेल: deansr @ hijli.iitkgp.ernet.in |